Webinar December 10th, for our upcoming webinar unveiling a novel approach to routine monitoring of rapid thermal annealing (RTA) using secondary ion mass spectrometry (SIMS).
Our speaker, Jack Jiang, Principal Engineer at NXP Semiconductors, brings over 30 years of expertise in R&D and SIMS applications. Jack will share compelling examples and analysis to address a critical question: Is SIMS a good technique for routine monitoring of RTA?
Key learnings will include:
Don’t miss this opportunity to discover how SIMS can enhance RTA monitoring and optimize semiconductor manufacturing processes.
Resgiter now to secure your spot:
REGISTER - 11AM CST / 6PM CET
About the Speaker
| Dr. Jack (Zhixiong) Jiang is a principle engineer in NXP Semiconductors. He has been committed to R&D and applications of SIMS for 30 years and published over 50 papers on SIMS fundamentals and applications. |