PRO Line PVD 75

Overview:

  • Thermal Evaporation (up to four 4" individual boats, or six 2" boat assemblies)

  • TORUS® Magnetron Sputtering sources (up to six 2" or 3" sources)

  • Electron Beam Evaporation Source (4 pocket 8cc, 8 pocket 12cc, 6 pocket 20cc)

  • LTE10 Organic deposition sources (up to two)

  • Combinations of the above techniques are also available.

  • Custom configurations are available upon request

Key features:

  • Enclosed instrument rack and chamber base

  • Box 304 stainless steel chamber with aluminum door and large viewport

  • Manual touch-screen or recipe-controlled

  • PC based process automation

  • Turbomolecular or optional cryogenic high vacuum pumping

 

 

 

Process Chamber Volume 100 liters

Process Chamber Geometry

Box Shaped 304L Stainless Steel chamber: 15.25” wide x 16.50” deep x 24” high (387.4mm wide x 419.1mm deep x 610mm high), internal dimensions.

Aluminum, O-ring sealed, hinged, front access door

O-ring sealed side plates (2), allow for maximum modularity and upgradeability

Process Chamber Construction 304L Stainless Steel with 6061 Aluminum Hinged Door

Cabinet Construction Carbon Steel, Fully Enclosed Instrument Rack, Open Chamber Area, Gray Powder Coat

Finish

Deposition Sources

(Available in various combinations)

Up to (6) 3'' Torus® Magnetron Sputtering Cathodes

4-Pocket 8cc Electron Beam Source, 8-Pocket 12cc, and 6-Pocket 20cc Available

Up to (4) 4'' Thermal Evaporation Sources

Up to 2 LTE Organic Material Evaporation Sources

Deposition Orientation Sputter Up, Evaporation Up

Substrate Cleaning Ion Source or Bias eH400 end-Hall ion source, KDC40 gridded ion source, or 100W RF bias

Substrate Size (max) Single 6'' (150mm) with 20 RPM Max Variable Rotation

Substrate Heating Up to 850°C (150mm) or water cooled (150mm)

Standard Vacuum Pumping

790 l/sec Turbo Pump — 5 x 10-7 torr (6.7 x 10-7 mbar)

1250 l/sec Turbo or — 8 x 10-8 torr (1.1 x 10-7 mbar)

1500 l/sec Cryo Pump Available — 5 x 10-8 torr (6.7 x 10-8 mbar)

Gauging Wide Range Vacuum Gauge

Process Gas 4 Channel Mass Flow Control with 3-position or variable position gate valve

System Control PC-Based HMI, eKLipseTM advanced recipe control and datalogging

Required Power (typical, based on options) 208VAC, 3Ø, 50/60 Hz; Optional 380VAC, 3Ø, 50/60 Hz

Available Certifications, Markings

Systems within the European Economic Area (EEA) are CE marked and comply with the

Following EU directives:

  • -Low Voltage Directive (LVD) 2014/35/EU
  • -Electromagnetic Compatibility (EMC) Directive 2014/30/EU
  • Systems outside of the EEA
  • can be CE marked as required
  • CSA and NRTL certification is available
  • Warranty 12 Months upon Shipment
  • Overall Dimensions (approx) 73.5” (1866.9mm) wide x 32” (812.8mm) deep x 75.9” (1928mm) high
  • Weight (approx) 1,800 lbs (816 kg)

Upgradable

  • Magnetron sputtering: RF, DC, Pulsed DC,
  • High-power pulsed magnetron sputtering
  • (HiPIMS/HPPMS)
  • Electron beam evaporation
  • Thermal evaporation
  • Organic materials evaporation
  • Ion source substrate cleaning or
  • Assisted deposition
  • Substrate heating, cooling, or biasing
  • Planetary substrate fixturing
  • Upstream or downstream pressure control
  • Film thickness control
  • Substrate load lock
  • On-site installation and training
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PRODUCTS

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