AXXIS Vacuum Thin Film Deposition System

Features

  • 18" diameter x 15" deep cylindrical 304 stainless steel chamber
  • Six radial process ports
  • Hinged front-loading door
  • Door- or port-mounted substrate fixtures
  • Turbomolecular or cryogenic pumping
  • Available with up to six TORUS® circular magnetron sputtering sources
  • Available with up to 6-pocket 5.5kW electron beam source
  • Available with up to three thermal evaporation sources
  • Optional ion source
  • Open framework
  • Instrument rack

Typical Applications

  • R&D Thin Film Deposition

Optional

  • Substrate fixture indexing and rotation
  • Load lock
  • Computer-controlled process automation

Process Options

  • Heating
  • Cooling
  • Bias
  • Ion Source for Substrate Cleaning/Assisted Deposition

Features

  • 18" diameter x 15" deep cylindrical 304 stainless steel chamber

  • Six radial process ports

  • Hinged front-loading door

  • Door- or port-mounted substrate fixtures

  • Turbomolecular or cryogenic pumping

  • Available with up to six TORUS® circular magnetron sputtering sources

  • Available with up to 6-pocket 5.5kW electron beam source

  • Available with up to three thermal evaporation sources

  • Optional ion source

  • Open framework

  • Instrument rack

  • R&D Thin Film Deposition
  • Substrate fixture indexing and rotation
  • Load lock
  • Computer-controlled process automation
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PRODUCTS

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